Development of World’s Highest Performance Thin Film Condenser
A new high-k dielectric nanosheet with a molecular-level thickness (~1.5 nm) has been successfully built through a solution-based bottom-up nanotechnology for the world's highest performance thin-film condenser. The device affords robust high-k properties even at several nanometer thicknesses, an ability that boosts capacitance.
Development of World’s Highest Performance Thin Film Condenser
High-k Dielectric Nanosheets Realizes the Smallest, Highest Capacitance Device
Mon 30 Aug 10 from Nano Tech Wire
Researchers in Japan develop world's highest performance thin-film condenser
A new high-k dielectric nanosheet with a molecular-level thickness (~1.5 nm) has been successfully built through a solution-based bottom-up nanotechnology for the world's highest performance ...
Mon 30 Aug 10 from R&D Mag
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